EN|中文

Dual chamber magnetron sputtering coating machine HD-CK1200-ICP

20220621143003250.jpg


Dual and multi chamber magnetron sputtering coating equipment:

The dual chamber magnetron sputtering coating machine HD-CK1200-ICP is a highly compatible device suitable for making filters, facial recognition and other products such as film (NCVM), car mounted, camera superhard AR, IR-CUT, etc; Different film layers such as NB2O5, SIO2, SI3N4, SIH, Cr, In can be prepared, and the coating process room is not empty, with excellent stability and repeatability. The whole drum translation continuous method is adopted.

◆ Workpiece rotation: 1~120r/min infinitely adjustable

Extreme vacuum:<2.0E-4Pa

◆ Film uniformity: ≤ 1% (T Max. - Tmin.)/(T Max.+Tmin.)

Effective coating size:

Effective sputtering area of HD-CK1200-ICP Φ 1200mm * H400mm

Since its establishment, the company has been a leading enterprise in the vacuum coating equipment industry and one of the few enterprises in the industry with the ability to design and integrate coating production line equipment as a whole. It has..

To view more